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# Senior Lithography Application Engineer

- **Company:** Nearfield Instruments
- **Location:** Rotterdam, Netherlands
- **Experience:** Expert
- **Contract:** Permanent contract
- **Skills:** Performance Tuning, BIG-IP Advanced Firewall Manager (AFM)
- **Published:** September 5, 2026
- **Apply:** https://www.adzuna.nl/details/5871534246

## About the Role

* PhD or MSc in Physics, Optical Engineering, Electrical Engineering, or related field.
 * Deep expertise in optical imaging, EUV lithography, and scanner performance optimization.
 * Proven experience in EUV mask, scatterometry, and resist characterization.
 * Ability to bridge lithography knowledge with metrology and process control applications.
 * 5+ years of industry or advanced academic research experience in semiconductor lithography, optical metrology, or related domains.
 * Strong analytical and problem-solving skills, with the ability to work across disciplines in a fast-paced R&D environment.

## Description

Senior application engineer in Lithography and Optical Imaging with a strong background in lithography, EUV, and scanner performance optimization. In this role, you will leverage your expertise in optical imaging and lithography physics to advance our metrology and process control solutions.

What will you be doing?

 * Develop and optimize optical imaging models and techniques for use in advanced metrology and inspection.
 * Translate scanner performance knowledge (CDU, focus, overlay, aberrations, imaging limits) into innovative process control solutions.
 * Apply expertise in (High-NA) EUV mask characterization, including 3D feature metrology (absorber CD, sidewall angle, height) and resist behavior under EUV and out-of-band light exposure.
 * Advance methods such as scatterometry and computational imaging to push the limits of in-line process control.
 * Collaborate with system architects, AFM/imaging experts, and software engineers to integrate imaging innovations into our commercial systems.
 * Work with leading global semiconductor fabs to validate and deploy solutions in high-volume manufacturing environments.


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